RTP, Rubidium Titanyl Phosphate, RbTiOPO4
• High homogeneity
• Excellent internal quality
• High electrical resistivity (1011 Ω·m)
• Wide temperature range (from ‐50◦C to +70◦C)
• Top quality of surface polishing
• Precise pair-matching
• Competitive price
• Mass production, quick delivery
RTP crystal is widely used for Electro-Optic applications whenever low switching voltages are required. e.g. in laser Q-switching system with high frequency repetition, high power and narrow pulse width. RTP E-O devices are not only used in laser micromachining and laser ranging, but also in major scientific exploration projects due to their excellent comprehensive performance.
As RTP is transparent from 400nm to 3.5µm, it can be used in multiple types of laser such as Er:YAG laser at 2.94µm with fairly good efficiency. Bulk absorption measurements at 1.064µm range from 50 to 150ppm using Photothermal Common Path Interferometer. RTP has high surface damage threshold of 15J/cm² (1064nm, 10ns, 10Hz).
Dimension Tolerance | ± 0.1 mm |
Angle Tolerance | < ± 0.25° |
Flatness | < λ/8 @ 632.8 nm |
Surface Quality | < 10/5 [S/D] |
Parallelism | < 20” |
Perpendicularity | ≤ 5' |
Chamfer | ≤ 0.2 mm @ 45° |
Transmitted Wavefront Distortion | < λ/8 @ 632.8 nm |
Clear Aperture | > 90% central area |
Coating | AR coating: R<0.1% @ 1064nm |
Laser Damage Threshold | 600 MW/cm2 for 1064nm, 10ns, 10Hz (AR-coated) |